The new NanoFrazor combines decades of experience with innovative solutions. Featuring cutting-edge technology, it empowers advanced research across diverse applications. With Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation, it enables cutting edge research and development. Its versatility is ensured through custom configurations, providing the right features for each application and setting.

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NanoFrazor

The NanoFrazor is suitable for a wide range of applications. Answer a few questions and put together your own personalised NanoFrazor.

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The NanoFrazor

in numbers

Thermal Probe Lithography

Single tip

Decapede

Direct Laser Sublimation

Minimum Structure
size (nm)

15

15

600

Minimum lines and
spaces (half pitch, nm)

25

25

1000

Grayscale resolution
(nm)

2

2

Write speed (with 50
nm pixels, μm2/min)

1’000

10’000

100’000

Many Features

One Machine

The NanoFrazor excels with advanced lithography for intricate tasks, offering high precision and resolution at the nanoscale. Its versatility suits a broad spectrum of research. A user-friendly interface simplifies design, while its robust design ensures reliability. Damage-free lithography, compatibility with standard methods, unique thermal cantilevers, precise overlay and stitching, in-situ imaging, and low ownership cost further highlight its capabilities.

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